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Automated Optical Inspection^wafer surface inspection system^YGK Corporation

TEL. +81-55-284-6866

595-2,Kuruwada Minami-Alps,Yamanashi 400-0311,Japan

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yNew developmentz
Wafer surface inspection system for SiC/GaN.
Driving dual laser head for SiC surface particle scanneryYPI-MX-ƒฦ DCz

››››››››ƒCƒ[ƒWYPI-MX-ƒฦ DC can measure not just SiC wafer but also a transparent wafer,Si wafer and LT wafer. Maximum sensitivity is 0.1ƒส‚ PSL.

4inch SiC wafer is measured within 5min. The result measurement includes a latent scratch information.

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LT wafer measurement result example

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CompactEhigh performance wafer surface inspection system.
The wafer surface particle scanneryYPI-MNz

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Transparent substrate is capable measurement 0.3um.

Si wafer is capable measurement 0.15um.

The measurement size is capable until 200mm. (Conditional)

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Compact and high performance AOI yDF/WF-100z

››››››››ƒCƒ[ƒWSuitable to change to automated inspection from manual optical inspection. High speed inspection for defects and particles on the wafer and substrate.

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‚x‚o‚h|‚l‚w seriesiAutomated transferj

Glass substrate/Sapphire wafer surface inspection system
yYPI-MX seriesiAutomated transferjz

››››››››ƒCƒ[ƒWThe YPI-MX is specialized transparent glass inspection which can be also applied to a high roughness of back side for various wafers/ substrates.

Isolating surface from back of wafer/substrate with high accuracy by autofocus sensor.

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‚x‚o‚h|‚l‚w seriesiManualj

Glass substrate/Sapphire wafer surface inspection system
yYPI-MX seriesiManul transferjz

››››››››ƒCƒ[ƒWThe YPI-MX is specialized transparent glass inspection which can be also applied to a high roughness of back side for various wafers/ substrates.

Isolating surface from back of wafer/substrate with high accuracy by autofocus sensor.

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‚x‚o‚h|‚m seriesiAutomated transferj

Wafer surface inspection system
yYPI-N series (Automated transfer)z

››››››››ƒCƒ[ƒWThe surface particle of the mirror finish substrate (silicon wafer, etc) can be scanned with high speed.

Handling wafer is wide range from 2inch to 8inch.

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‚x‚o‚h|‚m seriesiManualj

Wafer surface inspection system
yYPI-N series (Manual transfer)z

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The surface particle of the mirror finish substrate (silicon wafer, etc) can be scanned with high speed.

Handling wafer is wide range from 2inch to 8inch.

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Large glass substrate surface inspection system yYPI-500z

››››››››ƒCƒ[ƒWYPI-500 is able to inspect surface particles for transparent glass substrate and various large size film sheet.  The warpage of center substrate is compensated by autofocus sensor.

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Film sheet inspection system yYPI-200Fz

››››››››ƒCƒ[ƒWYPI-200F which is applied to a roll to roll handling of film sheet is capable film sheet surface inspection.

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0.3um detection capability particle sensor yYPC-03Uz

››››››››ƒCƒ[ƒWSuitable use inside of semiconductor process and inspection equipment and clean room as stainless body.  Clearly visible LED display is adopted. Quick measurement by easy use operation.

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Full automated transfer prober.

››››››››ƒCƒ[ƒWApplied to various alignment mark. Capable for high accuracy probing.

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Loader system

The substrates in a magazine rack are transferred automatically to process line equipment.


Unloader system

››››››››ƒCƒ[ƒWThe substrates transferred from the process line equipment are stored automatically to magazine rack.

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Airborne particle counteryAerosol Sondez

››››››››ƒCƒ[ƒWAirborne particle counter for attaching a hot-air balloon. Measurement aerosol concentration by particle size each.

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Remove electro-static equipment yIonizerz

››››››››ƒCƒ[ƒWControl maximum ion output by detecting ion output with the unique sensor.

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YGK Corporation

595-2,Kuruwada Minami-Alps,
Yamanashi 400-0311,japan

TEL +81-55-284-6866
FAX +81-55-284-6867